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CHEMICAL VAPOR DEPOSITION CVD REACTION CHAMBER
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CHEMICAL VAPOR DEPOSITION CVD REACTION CHAMBER

NASA / GRC · 1989-03-12 · photograph (digital archive)

From the collection of NASA Image and Video Library. Free to download, adapt and use — no permission needed.

About this work

Shigehiro Nishino -- Visiting faculty fellow Dr. Shigehiro Nishino introduced the Lewis team to a unique chemical vapor deposition (CVD) strategy to grow silicon carbide crystals on silicon wafers.

NASA Image and Video Library’s own description
Credit lineCHEMICAL VAPOR DEPOSITION CVD REACTION CHAMBER. NASA/GRC, 1989-03-12. Public domain. ID: GRC-1989-C-02573.

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